National Nanotechnology Infrastructure Network

National Nanotechnology Infrastructure Network

Serving Nanoscale Science, Engineering & Technology

NNIN Etch Workshop - NNIN Staff ONLY!

Tuesday and Wednesday, May 21 - 22, 2013
Cornell University, Ithaca, NY

Day 1:  NNIN Site Updates (NNIN Etch Staff)

  • Current listing of all dry etch equipment including RIE, ICP, ECR, ion milling, ashing or strip, and dry release tools (XeF2, VHF) and documented processes
  • Gas chemistries to each tool
  • Wafer or substrate sizes, clamped/unclamped, electrode temperature ranges
  • Current processes-allowed materials, masking materials
  • Process results, DOEs, SEMs, etch rates, selectiveness, etc
  • Baselining efforts
  • Chamber conditioning strategies
  • Maintenance issues/preventative maintenance strategies
  • Future plans for equipment acquisition, modification, and additional processes

Day 2:  Selected talks on advanced etch processes (NNIN Etch Staff)

  • Nanoscale etching of silicon (DRIE, Cl2 based, HBr based, cryoetch, mixed etch), III-Vs, SiC, Dielectrics-silicon based (oxide, nitrides, oxynitrides), Dielectrics-High K, Low K, Metals, piezomaterials, magnetic based materials.
  • Pattern transfer of electron beam, Deep UV, and nanoimprint lithographically defined features
THIS EVENT IS FOR NNIN STAFF ONLY!

 

Workshop Questions: Vince Genova, CNF [email]

Click here for presentations from this workshop

Directions and Parking for Cornell Campus

Dates: 
Tue, 05/21/2013 (All day) to Wed, 05/22/2013 (All day)
This event requires an RSVP: 
Yes
Location: 
Cornell University - Ithaca, NY

Upcoming Events

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