Process Integration Engineer
Noah is a process integration engineer in nanotechnology and microfabrication. Over the years, he has worked with many research groups and companies. Following nearly a decade in industry, he returned to work in University laboratories during 2007. At CNF, he primarily supports researchers in lithography. Example projects include conformal resist spray coating, precision resist coating for deep ultraviolet lithography, source mask optimization, nanoimprint as well as high resolution optical and electron beam patterning. For lithography simulation, Noah utilizes Layout Beamer (EBL), Layout Lab (contact lith) and Prolith (stepper). Current interests are in top-down patterning of nanowires, phase shift lithography, large gap proximity imaging and nanoimprint using substrate conformal imprint lithography.