University of Washington
Microfabrication Facility and Molecular & NanoTech User Facility/Center for Nanotechnology
University of Washington, Seattle
Expertise: Nanoscale Science and Technology for Biology and Biomedical Applications
The University of Washington NNIN node (UW-NNIN) has primary responsibilities in the areas of biological and life sciences, society and ethics (SEI), and, together with University of Michigan, in connecting the network to the aquatic science community. UW-NNIN employs a technical staff of 9 and consists of the Microfabrication Facility (MFF) and the Molecular & NanoTech User Facility (NTUF).
MFF occupies 15,000 sq ft (8,000 sq ft of cleanroom space) and provides access to state-of-the-art micro- and nanofabrication equipment including photolithography, thin-film deposition, plasma and chemical etching, and characterization processes. Wet processing is divided into acid/base chemical etching and a suite of lithography equipment capable of 1 µm resolution using contact aligners. Advanced electron beam lithography (EBL) with resolutions down to 8 nm is available on a JEOL JBX-6300FS system. Thin-film processing features a broad range of deposition options for metals and dielectrics via sputtering, evaporation and chemical vapor deposition; etching of dielectrics and metals is performed via reactive ion etching. High-temperature deposition equipment includes plasma-enhanced CVD, low-pressure CVD for silicon nitride and oxides, growth of silicon dioxide through wet oxidation, and a carbon nanotube reactor. MFF also houses soft lithography, dip-pen nanolithography and nano-imprinting tools.
NTUF recently relocated to the new Molecular Engineering and Science Building (MolES). It is equipped with a broad range of tools that include cell culture facility, scanning probe microscopies, laser scanning confocal microscopy, fluorescence microscopy, Raman confocal microscopy, surface plasmon resonance spectroscopy, 2D X-ray diffraction, ellipsometry and scanning and transmission electron microscopies with EDS capabilities. NTUF also provides complementary e-beam lithography on the SEM for prototyping and research.
Well-established training programs allow users to master tools quickly. UW-NNIN operates as a cost facility and is available on a 24/7 basis for qualified users from both academia and industry.