University of Washington
Washington Nanofabrication Facility and Molecular Analysis Facility
University of Washington, Seattle
Expertise: Nanoscale Science and Technology for Biology and Biomedical Applications
The University of Washington NNIN node (UW-NNIN) has primary responsibilities in the areas of biological and life sciences, and, together with University of Michigan, in connecting the network to the aquatic science community. UW-NNIN employs a technical staff of 9 and consists of the Washington Nanofabricatin Facility (WNF) and the Molecular Analysis Facility (MAF).
WNF occupies 15,000 sq ft (8,000 sq ft of cleanroom space) and provides access to state-of-the-art micro- and nanofabrication equipment including photolithography, thin-film deposition, plasma and chemical etching, and characterization processes. Wet processing is divided into acid/base chemical etching and a suite of lithography equipment capable of 1 µm resolution using contact aligners. Advanced electron beam lithography (EBL) with resolutions down to 8 nm is available on a JEOL JBX-6300FS system. Thin-film processing features a broad range of deposition options for metals and dielectrics via sputtering, evaporation and chemical vapor deposition; etching of dielectrics and metals is performed via reactive ion etching. High-temperature deposition equipment includes plasma-enhanced CVD, low-pressure CVD for silicon nitride and oxides, growth of silicon dioxide through wet oxidation, and a carbon nanotube reactor. WNF also houses soft lithography, dip-pen nanolithography and nano-imprinting tools.
MAF recently relocated to the new Molecular Engineering and Science Building (MolES). It is equipped with a broad range of tools that include cell culture facility, scanning probe microscopies, laser scanning confocal microscopy, fluorescence microscopy, Raman confocal microscopy, surface plasmon resonance spectroscopy, 2D X-ray diffraction, ellipsometry and scanning and transmission electron microscopies with EDS capabilities. MAF also provides complementary e-beam lithography on the SEM for prototyping and research.
Well-established training programs allow users to master tools quickly. UW-NNIN operates as a cost facility and is available on a 24/7 basis for qualified users from both academia and industry.