National Nanotechnology Infrastructure Network

National Nanotechnology Infrastructure Network

Serving Nanoscale Science, Engineering & Technology

Process Blogs containing ALD

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Atomic Layer Deposition of SrO at Stanford Nanofabrication Facility

03.11.13

Michelle Rincon and Woo Shik Jung, Stanford Nanofabrication Facility

Our goal at the SNF is to enable users to develop any film they need using our Cambridge Nanotech Savannah (thermal ALD system) and Fiji (plasma-enhanced ALD) systems.  One great example of this is our newly developed SrO deposition process.

The SrO film was developed using the Bis(1,2,4-tritertiarybutylcyclopentadienyl)strontium precursor.  Since this precursor has a low vapor pressure (0.6mmHg at...

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NNIN ALD Processes and NNIN ALD Workshop

01.29.13

Lynn Rathbun, NNIN
Posted Jan. 2013

Atomic Layer Deposition (ALD) is an important new thin film deposition technology. ALD allows for deposition of ultra thin, high uniformity films over large topographical variations. The process relies upon self limiting chemical reactions to depost one molecular layer at a time. The heart of ALD is thus in the development of the exotic organic precursors that allow the growth  of  a particular films. Each of these...

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New ALD Processes at Cornell on the Oxford FlexAl

10.15.12

Vincent Genova, CNF Process Engineer
Posted October 2012

Since CNF’s purchase of an Oxford Instruments FlexAL ALD system in 2008, we have continued to develop new thin film processes, both on our own and cooperatively with Oxford.  Our ALD system has both thermal and plasma enhanced (PEALD) deposition capability for materials derived from hafnium (Hf), aluminum (Al), tantalum (Ta), and silicon (Si) based organometallic and organosilane precursors.  In addition...

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