National Nanotechnology Infrastructure Network

NNIN ALD Processes and NNIN ALD Workshop

Lynn Rathbun, NNIN
Posted Jan. 2013

Atomic Layer Deposition (ALD) is an important new thin film deposition technology. ALD allows for deposition of ultra thin, high uniformity films over large topographical variations. The process relies upon self limiting chemical reactions to depost one molecular layer at a time. The heart of ALD is thus in the development of the exotic organic precursors that allow the growth  of  a particular films. Each of these...