Process Blogs containing Michigan
Lurie Nanofabrication Facility takes lead on Nanoscale Patterning on Nonplanar Surfaces using Electron Beam Lithography
Vishva Ray and Khaled Mnaymneh, University of Michigan Patterning nanoscale geometries on curved and nonplanar surfaces is essential for next-generation devices particularly in the areas of flexible electronics, optics, metamaterials, bioengineering and fluidics. While current methods are extremely limited in applicability and scope, patterning nonplanar surfaces using electron beam lithography offers a distinct advantage with respect to feature sizes, repeatability...
DRIE on Si and Dielectrics at Michigan Lurie Nanofabrication Facility
Kevin Owen , University of Michigan With the recent expansion at the LNF, three new SPTS ICP systems were installed: two Pegasus deep silicon etchers and one APS system, designed for deep glass and dielectric etching. These tools have pushed the limits of high aspect ratio plasma etching. The first part of this paper covers deep silicon etching using the SPTS Pegasus tool, including standard process capabilities as well as two novel...
Posted January 2013