National Nanotechnology Infrastructure Network

National Nanotechnology Infrastructure Network

Serving Nanoscale Science, Engineering & Technology

Process Blogs containing NIL

Displaying 1 - 1 of 1

Nanonex NX-2500 Nanoimprint Lithography Update (Cornell)

10.21.12

Vincent Genova, Process Engineer, CNF
Posted Oct. 2012

Nanoimprint lithography (NIL) has the advantage of high throughput with sub-10nm resolution.  NIL is included on the ITRS roadmap for 45nm and below nodes for advanced electronic devices.  In addition to electronics, NIL is a benefit to many applications including displays, nanophotonics, biotechnology, and MEMS.

The NX-2500 has both thermal imprint (T-NIL) and photocurable imprint (P-NIL)...

Read more

0 Comments