Process Blogs containing NIL
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Nanonex NX-2500 Nanoimprint Lithography Update (Cornell)
10.21.12
Vincent Genova, Process Engineer, CNF Nanoimprint lithography (NIL) has the advantage of high throughput with sub-10nm resolution. NIL is included on the ITRS roadmap for 45nm and below nodes for advanced electronic devices. In addition to electronics, NIL is a benefit to many applications including displays, nanophotonics, biotechnology, and MEMS. The NX-2500 has both thermal imprint (T-NIL) and photocurable imprint (P-NIL)...
Posted Oct. 2012
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