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Process Blogs containing Reactive Ion Etch

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NNIN Etch Workshop Summary and NNIN Dry Etch Capabilities

06.12.13

Vince Genova

Cornell NanoScale Science and Technology Facility

A NNIN Etch Workshop for NNIN Staff was held at Cornell University on May 21-22, 2013.  This was the third NNIN etch workshop held at Cornell since 2006.  Etch personnel from every NNIN site attended and presented information on their current etch capabilities, along with current process results.   Equipment details such as current gas chemistries, wafer sizes, temperature ranges and many others...

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DRIE on Si and Dielectrics at Michigan Lurie Nanofabrication Facility

01.29.13

Kevin Owen , University of Michigan
Posted January 2013

With the recent expansion at the LNF, three new SPTS ICP systems were installed: two Pegasus deep silicon etchers and one APS system, designed for deep glass and dielectric etching. These tools have pushed the limits of high aspect ratio plasma etching. The first part of this paper covers deep silicon etching using the SPTS Pegasus tool, including standard process capabilities as well as two novel...

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