National Nanotechnology Infrastructure Network

National Nanotechnology Infrastructure Network

Serving Nanoscale Science, Engineering & Technology

Process Blogs containing Silicon

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Nanoscale Etching of Silicon with High Mask Selectivity using SF6/C4F8/Ar ICP Etching in Plasma-Therm SLR 790 System

09.17.13

Yung-Jr Hung (NTUST, Taiwan) and Brian Thibeault (UCSB)

September 2013

Nanoscale and fine-scale etching recipes of silicon are needed more and more for silicon-based photonics and other applications at the UCSB facility. This particular work, done a few years ago, highlights the recipes developed in the UCSB nanofabrication facility for these applications. The original application pursued by this work was for silicon-based photonic crystal...

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DRIE on Si and Dielectrics at Michigan Lurie Nanofabrication Facility

01.29.13

Kevin Owen , University of Michigan
Posted January 2013

With the recent expansion at the LNF, three new SPTS ICP systems were installed: two Pegasus deep silicon etchers and one APS system, designed for deep glass and dielectric etching. These tools have pushed the limits of high aspect ratio plasma etching. The first part of this paper covers deep silicon etching using the SPTS Pegasus tool, including standard process capabilities as well as two novel...

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