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Lurie Nanofabrication Facility takes lead on Nanoscale Patterning on Nonplanar Surfaces using Electron Beam Lithography

01.29.13

Vishva Ray  and Khaled Mnaymneh, University of Michigan

Patterning nanoscale geometries on curved and nonplanar surfaces is essential for next-generation devices particularly in the areas of flexible electronics, optics, metamaterials, bioengineering and fluidics.  While current methods are extremely limited in applicability and scope, patterning nonplanar surfaces using electron beam lithography offers a distinct advantage with respect to feature sizes, repeatability...

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