Marylene Palard joined the MRC UT-Austin facilities in Jan 2004. She was involved in the set up of the nanoimprinting process line. She developed an E-beam master library and transfer etch recipes into underlayer for imprinted substrates.
She has expertise in AFM and other characterization techniques (SEM, ellipsometry,..). She is currently developing an interest for ALD films. Marylene had previously acquired experiences at STM’s chip plant manufacturer and Balzer’s R&D flat panel display center located in France
- Yujia Zhai, Marylene Palard, Leo Mathew, Muhammad Mustafa Hussain, C. Grant Willson, Emanuel Tutuc, Sanjay K. Banerjee1, Fabrication of three-dimensional MIS nano-capacitor based on nano-imprinted single crystal silicon nanowire array, Micro and Nanosystems, vol 4, (2012)
- D.D. Cheam, P. S. K. Karre, M. Palard and P. L. Bergstrom, “Step-and-Flash Imprint Lithography for quantum dots based room temperature single electron transistor fabrication”, Microelectronic Engineering Vol 86, Issues 4-6, April-June 2009, 646-649
- D. Y. Fozdar, W. Zhang, M. Palard, C. W. Patrick, Jr., Shaochen Chen, “Flash Imprint Lithography using a mask aligner: Nanoimprinting in Polyethylene Glycol For Biomedical Applications. 2008 Nanotechnology 19 215303 (13pp).
- S. Joshi, D. Ahmad, M. Palard, D. Kelly, D. Onsongo, S. Dey, L. Fei, T. Torack, M. Seacrist, B. Kellerman and SK Banerjee, “Oxide and hot carrier reliability studies for strained Si-on relaxed SiGe MOS devices”. Silicon nitride, silicon dioxide thin insulating films, and other emerging dielectrics VIII: proceedings of the international symposium, 2005, p353.