National Nanotechnology Infrastructure Network

National Nanotechnology Infrastructure Network

Serving Nanoscale Science, Engineering & Technology

William Mitchell


University of California at Santa Barbara


Principal Development Engineer

Electron Beam Lithography

  • resist processing/characterization
  • liftoff/etching processes on the nanoscale
  • Advanced pattern preparation (Layouts/fracturing/proximity corrections)

Scanning Electron Microscopy/Atomic Force Microscopy

  • Insulator imaging using Gentle Beam mode in JEOL 7600F SEM
  • X-ray Microanalysis for elemental identification in Sirion XL-30 SEM
  • Localized Oxidation using AFM Lithography

Atomic Layer Deposition

  • Dielectrics for III-V CMOS technology
  • In-situ As-decapping methods for III-V interface preservation (monitored with Woollam Spectroscopic Ellipsometer)"