William Mitchell
Principal Development Engineer
Electron Beam Lithography
- resist processing/characterization
- liftoff/etching processes on the nanoscale
- Advanced pattern preparation (Layouts/fracturing/proximity corrections)
Scanning Electron Microscopy/Atomic Force Microscopy
- Insulator imaging using Gentle Beam mode in JEOL 7600F SEM
- X-ray Microanalysis for elemental identification in Sirion XL-30 SEM
- Localized Oxidation using AFM Lithography
Atomic Layer Deposition
- Dielectrics for III-V CMOS technology
- In-situ As-decapping methods for III-V interface preservation (monitored with Woollam Spectroscopic Ellipsometer)"