Vincent Genova, Process Engineer, Cornell
Posted Dec. 2012
Vincent Genova, Process Engineer, CNF
Posted Oct. 2012
Nanoimprint lithography (NIL) has the advantage of high throughput with sub-10nm resolution. NIL is included on the ITRS roadmap for 45nm and below nodes for advanced electronic devices. In addition to electronics, NIL is a benefit to many applications including displays, nanophotonics, biotechnology, and MEMS.
Submitted by lcr2 on Wed, 10/17/2012 - 9:12pm
At CNF, we start each Societal and Ethical Issues training with an introduction slide. Believe it or not, by the time the users see me at 3:15pm they STILL haven’t introduced themselves to each other. We ask the users to do three things: 1.) say your name, 2.) provide your institutional background, and 3.) explain your research as if you were explaining it to your non-engineering grandmother. The point is can you explain what you do in a way that anyone can understand?
Vincent Genova, CNF Process Engineer
Posted Oct. 2012
Vincent Genova, CNF Process Engineer
Posted October 2012
Significant Upgrade to the Oxford PlasmaLab 100 at Cornell for Nanoscale Dielectric Etching Enables Improved Etching of High Aspect Ratio Dielectric Structures
Vincent Genova, CNF Process Engineer
Posted October 2012
