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CNF

Photocurable Nanoimprint (P-NIL) Process for Patterning Nitride and Oxide (Cornell)

Vincent Genova, Process Engineer, Cornell
Posted Dec. 2012

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Nanonex NX-2500 Nanoimprint Lithography Update (Cornell)

Vincent Genova, Process Engineer, CNF
Posted Oct. 2012

Nanoimprint lithography (NIL) has the advantage of high throughput with sub-10nm resolution. NIL is included on the ITRS roadmap for 45nm and below nodes for advanced electronic devices. In addition to electronics, NIL is a benefit to many applications including displays, nanophotonics, biotechnology, and MEMS.

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Primaxx Vapor HF Release for Oxide MEMS Structures at Cornell

Vincent Genova, CNF Process Engineer
Posted Oct. 2012

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New ALD Processes at Cornell on the Oxford FlexAl

Vincent Genova, CNF Process Engineer
Posted October 2012

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High aspect ratio etching of sub 100 nm structures in dielectrics

Significant Upgrade to the Oxford PlasmaLab 100 at Cornell for Nanoscale Dielectric Etching Enables Improved Etching of High Aspect Ratio Dielectric Structures

Vincent Genova, CNF Process Engineer
Posted October 2012

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