National Nanotechnology Infrastructure Network

National Nanotechnology Infrastructure Network

Serving Nanoscale Science, Engineering & Technology


Nanonex NX-2500 Nanoimprint Lithography Update (Cornell)

Vincent Genova, Process Engineer, CNF
Posted Oct. 2012

Nanoimprint lithography (NIL) has the advantage of high throughput with sub-10nm resolution.  NIL is included on the ITRS roadmap for 45nm and below nodes for advanced electronic devices.  In addition to electronics, NIL is a benefit to many applications including displays, nanophotonics, biotechnology, and MEMS.

High aspect ratio etching of sub 100 nm structures in dielectrics

Significant Upgrade to the Oxford PlasmaLab 100 at Cornell for Nanoscale Dielectric Etching Enables Improved Etching of High Aspect Ratio Dielectric Structures

Vincent Genova, CNF Process Engineer
Posted October 2012

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